Radioelektronikos terminų žodynas. – Vilnius : BĮ UAB „Litimo“. Kazimieras Gaivenis, Gytis Juška, Vidas Kalesinskas. 2000.
Photoresist-Doppelmaske — dviguboji fotorezisto kaukė statusas T sritis radioelektronika atitikmenys: angl. double photoresist mask vok. Photoresist Doppelmaske, f rus. двойная маска из фоторезиста, f pranc. masque double en photorésist, m … Radioelektronikos terminų žodynas
Double patterning — is a class of technologies developed for photolithography to enhance the feature density. For the semiconductor industry, double patterning is the only lithography technique to be used for the 32 nm and 22 nm half pitch nodes in 2008 2009 and… … Wikipedia
masque double en photorésist — dviguboji fotorezisto kaukė statusas T sritis radioelektronika atitikmenys: angl. double photoresist mask vok. Photoresist Doppelmaske, f rus. двойная маска из фоторезиста, f pranc. masque double en photorésist, m … Radioelektronikos terminų žodynas
Photoresist — A photoresist is a light sensitive material used in several industrial processes, such as photolithography and photoengraving to form a patterned coating on a surface. Contents 1 Photoresist categories 1.1 Tone 1.2 Developing light wavelength … Wikipedia
dviguboji fotorezisto kaukė — statusas T sritis radioelektronika atitikmenys: angl. double photoresist mask vok. Photoresist Doppelmaske, f rus. двойная маска из фоторезиста, f pranc. masque double en photorésist, m … Radioelektronikos terminų žodynas
двойная маска из фоторезиста — dviguboji fotorezisto kaukė statusas T sritis radioelektronika atitikmenys: angl. double photoresist mask vok. Photoresist Doppelmaske, f rus. двойная маска из фоторезиста, f pranc. masque double en photorésist, m … Radioelektronikos terminų žodynas
Multiple patterning — is a class of technologies developed for photolithography to enhance the feature density. The simplest case of multiple patterning is double patterning, where a conventional lithography process is enhanced to produce double the expected number of … Wikipedia
Extreme ultraviolet lithography — (also known as EUV or EUVL ) is a next generation lithography technology using the 13.5 nm EUV wavelength. EUVL opticsEUVL is a significant departure from the deep ultraviolet lithography used today. All matter absorbs EUV radiation. Hence, EUV… … Wikipedia
Contact lithography — Contact lithography, also known as contact printing, is a form of photolithography whereby the image to be printed is obtained by illumination of a photomask in direct contact with a substrate coated with an imaging photoresist layer. Contents 1… … Wikipedia
Immersion lithography — is a photolithography resolution enhancement technique that replaces the usual air gap between the final lens and the wafer surface with a liquid medium that has a refractive index greater than one. The resolution is increased by a factor equal… … Wikipedia
